ITO sputtering target
In stock
Price:
800 CNY
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Seller
China, Beijing
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Technical characteristics
- BrandZhongnuo
- Country of manufactureChina
- sputtering targetITO
- Purity99.99%
- Chemical compositionIn2O3;SnO2
Description
ITO sputtering target:
Composition: In2O3 (wt%):SnO2 (wt%)=90:10 / 95:5 / 97:3
Purity: 99.99% (ICP—AES)
Color: black
Resistivity:≤1.8×10-4Ω·cm
Factual size: 5~15μm
Resistivity: <0.12mΩ·cm
Coefficient of linear thermal expansion: 8.2×10-3K-1
Grain size: SEM test
Main application: produce transparency conductive electrode by vapor deposition
Relative density: above 99% ( low pressure oxygen atmosphere sintering method)
Dimension: Largest single chip size of ITO target which is used in TFT - LCD industry, large size can be spliced.
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ITO sputtering target
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